A nitride semiconductor light emitting device includes an emission layer (106)
having a multiple quantum well structure where a plurality of quantum well layers
and a plurality of barrier layers are alternately stacked. The quantum well layer
is formed of XN1-x-y-zAsxPySbz (0x0.15,
0y0.2, 0z0.05, x+y+z0) where X represents
one or more kinds of group III elements. The barrier layer is formed of a nitride
semiconductor layer containing at least Al.