A surface emitting semiconductor laser device including a substrate, a bottom DBR, and a mesa post having a layer structure, the layer structure including a top DBR including a plurality of pairs, each of said pairs including an Al-containing high-reflectivity layer and an Al-containing low-reflectivity layer, an active layer structure sandwiched between the DBRs for emitting laser, and a current confinement layer disposed within or in a vicinity of one of the DBRs, the current confinement layer including a central current injection area and an annular current blocking area encircling the central current injection area, the annular current blocking area being formed by selective oxidation of Al in an Al.sub.XGa.sub.1-XAs layer (0.95.ltoreq.x<1) having a thickness below 60 nm, the Al-containing low-reflectivity layer including Al at an atomic ratio not more than 0.8 and below 0.9. The progress of the oxidation in the Al-containing compound semiconductor layers can be suppressed during the formation of the current confinement oxide area by restricting the Al content in the specified range, thereby realizing the surface emitting semiconductor laser device having the longer lifetime, or the higher reliability.