A positive resist composition comprises (A) a resin component which becomes soluble in an alkaline developer under the action of an acid and (B) an acid generator. The resin (A) is a polymer comprising specific recurring units. When processed by ArF lithography, the composition is improved in resolution and forms a pattern with a minimal line edge roughness.

 
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< Polyimide resin soluble in aqueous alkaline solution, composition comprising the resin and cured coating prepared from the composition

> Rework process for photoresist film

> Methods of preparing a polymerization catalyst

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