An integrated circuit device is described. In particular, the integrated circuit comprises a substrate comprising active devices; a plurality of metal layers formed over the substrate, the plurality of metal layers being separated by insulating layers; a plurality of vias enabling connections to the active devices of the substrate; a contact pad support structure defining an opening in a metal layer of the plurality of metal layers and being coupled to an interconnect line; and a contact pad formed over the contact pad support structure. A method of implementing a contact pad in an integrated circuit is also disclosed.