A system and method is provided for applying a developer to a photoresist
material layer disposed on a semiconductor substrate. The developer system
and method employ a developer plate having a plurality of a apertures for
dispensing developer. Preferably, the developer plate has a bottom surface
with a shape that is similar to the wafer. The developer plate is disposed
above the wafer and substantially and/or completely surrounds the top
surface of the wafer during application of the developer. A small gap is
formed between the wafer and the bottom surface of the developer plate.
The wafer and the developer plate form a parallel plate pair, such that
the gap can be made small enough so that the developer fluid quickly fills
the gap. A differential voltage is applied to the developer plate and the
wafer causing an electric field to be formed in the gap. Transportation of
negatively charge photoresist material is facilitated by exposure to the
electric field during the development process.
