Method of application of electrical biasing to enhance metal deposition

   
   

A method and associated apparatus includes depositing metal on a plating surface of an object immersed in an electrolyte solution prior to bulk deposition on the plating surface. In one aspect, the method further includes applying a voltage between an anode and the plating surface to enhance the concentration of metal ions in the electrolyte solution that is contained in a feature on the plating surface prior to the bulk deposition on the plating surface.

 
Web www.patentalert.com

< Optical interferometer generating a mode-locked laser oscillation, all-optical switch, all-optical asymmetric demultiplexer and all optical pulse reshaping apparatus

< Apparatus and method for electroless deposition of materials on semiconductor substrates

> Plating method and plating apparatus

> Semiconductor device package and method of production and semiconductor device of same

~ 00192