A method for producing a semiconductor component, and a semiconductor component, having a metallic gate electrode deposited onto a semiconductor layer, with the gate electrode having a gate foot and a gate head. The component is produced by depositing a first layer of aluminum on the semiconductor layer, depositing a second layer of a second metal on the first layer, depositing at least one additional layer (G3) of an additional metal, different from the second metal, on the second layer, and carrying out a temperature treatment at elevated temperature.

 
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< Etch aided by electrically shorting upper and lower sidewall portions during the formation of a semiconductor device

> Die-up integrated circuit package with grounded stiffener

> Wiring structure of a semiconductor device and method of forming the same

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