A method of forming emitter tips on a field emission display. A conductive layer
is formed on a substrate, and then a photoresist layer is formed on the conductive
layer wherein the photoresist layer has at least a pattern for defining predetermined
areas of the emitter tips. Next, using plasma etching with the pattern of the photoresist
layer as a mask, the conductive layer is etched to become a plurality of emitter
stages. The etching rate of the conductive layer is greater than the etching rate
of the photoresist layer. Finally, continuous use of plasma etching with an increased
vertical-etching rate etches the lateral sidewalls of the emitter stages, thus
shaping them as emitter tips.
